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PI XYZ Nanopositioning Stage Delivers 0.1 nm Positioning Resolution for Demanding Applications

Source: PI North America
18 August, 2026
Feature Image for PI XYZ Nanopositioning Stage Delivers 0.1 nm Positioning Resolution for Demanding Applications
The high-precision XYZ piezo stage is designed for super-resolution microscopy, AFM, surface metrology and advanced imaging.

SHREWSBURY, Mass., Aug. 18, 2026 — PI (Physik Instrumente), a global leader in precision motion control and nanopositioning technology, offers the P-733 XYZ piezo nanopositioning stage, delivering 0.1 nm (1 Å) positioning resolution for demanding applications in super-resolution microscopy, atomic force microscopy (AFM), surface nanometrology and advanced imaging. 

The P-733 combines frictionless flexure guidance with high-accuracy capacitive position feedback to achieve sub-nanometer positioning performance and highly repeatable motion. Travel ranges of up to 100 × 100 µm in X and Y and 10 µm in Z enable precision sample scanning and measurement across comparatively large areas. A 50 × 50 mm clear aperture supports transmitted-light microscopy and other optical imaging techniques.

High-stiffness direct-drive version for maximum throughput 

For applications that demand the highest scanning speeds and fastest settling times, the P-733.3DD direct-drive version provides 30 × 30 × 10 µm travel with the same 0.1 nm resolution. Its high-stiffness design supports rapid scanning and dynamic positioning, with resonant frequencies exceeding 1 kHz.

The stage architecture incorporates parallel kinematics and parallel metrology, ensuring that all motion axes are measured relative to a common fixed reference. This design actively compensates for crosstalk and guiding errors, helping maintain nanometer-level tracking accuracy during high-speed scanning and precision measurement tasks.

Key features: 

  • 0.1 nm (1 Å) positioning resolution
  • UHV-compatible and nonmagnetic versions available 
  • XYZ motion with travel ranges up to 100 × 100 × 10 µm
  • 50 × 50 mm clear aperture for transmitted-light microscopy
  • Capacitive feedback sensors with up to 99.97% motion linearity
  • Parallel kinematics and parallel metrology for enhanced multi-axis accuracy
  • High-stiffness direct-drive variant for fast scanning and shortest step-and-settle times
  • Ideal for wafer metrology, super-resolution microscopy, nanoimprinting, surface metrology and image stabilization

Wear-free design for long-term stability 

The P-733 employs wear-free, zero-play flexure guides and PICMA multilayer piezo actuators, eliminating mechanical friction and backlash. Noncontact capacitive sensors provide highly linear position measurement with exceptional long-term stability and typical linearity of 99.97%.

Applications and industries served

The P-733 is designed for a broad range of industrial and scientific applications, including super-resolution and confocal microscopy, AFM, surface characterization, wafer positioning, nanoimprinting, micromanipulation, precision optics and image stabilization. Ultra-high-vacuum-compatible and nonmagnetic configurations are available for specialized environments. Markets and Applications. In addition to super-resolution and confocal microscopy, the P-733 is suitable for surface measurement, wafer positioning, nanoimprinting, micromanipulation and image stabilization. Ultra-high-vacuum-compatible and nonmagnetic versions are available on request.

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