October 1, 2013 - STAUFF releases LPM II Particle Monitor for hydraulics.which uses high-performance LEDs to provide a precise image of the degree of contamination in the hydraulic system. Thanks to its eight measuring channels, it is possible to distinguish particle sizes of between 4 μm and 70 μm. This allows a user to assess the contamination even at higher contamination classes. The LPM II is permanently installed for continuous monitoring of the hydraulic system.
As a result, the LPM II allows users to quickly respond to increasing contamination, thus protecting the system from expensive failures and machine downtimes. It is available in two versions: LPM II-D with display and keypad; and LPM II-O without display and keypad. (Either unit is available with an integrated moisture sensor.) Because of its robust and compact structure, the LPM II is not sensitive to jolts, shocks, dust and moisture (IP 65 International Protection Rating) and can be used with virtually any common hydraulic fluid. The device shows the measured data on the display as a contamination class according to ISO 4406:1999, NAS 1638, AS 4059E and ISO 11218 or as a particle count per size.
If the hydraulic system is not easy to access, a separate LPM II-REMOTE can be installed in a conveniently location. The integrated Modbus and CAN Bus interfaces can be used to connect the device to existing machine control, and data acquisition systems.
